Standard Specification (%) | |
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Assay | 96.0 ± 0.5% |
Semiconductor sulfuric acid
Semiconductor Sulfuric Acid
Semiconductor Sulfuric Acid
When processing a wafer, organic and metal contaminants on the silicon surface are easily oxidized and removed by adding high-purity sulfuric acid.
Korea Zinc 17 lines in the Korea Zinc Onsan plants and is stably producing high-purity sulfuric acid.
Korea Zinc 17 lines in the Korea Zinc Onsan plants and is stably producing high-purity sulfuric acid.

Purpose of the Product
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Cleaning and Etching for Semiconductor Manufacturing Process
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Chemical & Fertilizer Industry
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Metal Refining
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Fiber Industry
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Steel Making
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Paper Manufacturing Industry
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Spinning and Weaving Industry
Details
Metal Impurities | ||||||
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Arsenic (As) | Antimony (Sb) | Aluminum (Al) | Barium (Ba) | Berylium (Be) | Bismuth (Bi) | Cadmium (Cd) |
0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max |
Calcium (Ca) | Chromium (Cr) | Cobalt (Co) | Copper (Cu) | Potassium (K) | Gallium (Ga) | Germanium (Ge) |
0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max |
Gold (Au) | Iron (Fe) | Lead (Pb) | Lithium (Li) | Magnesium (Mg) | Manganese (Mn) | Molybdenum (Mo) |
0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max |
Nickel (Ni) | Niobium (Nb) | Zirconium (Zr) | Selenium (Se) | Silicon (Si) | Silver (Ag) | Sodium (Na) |
0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max |
Strontium (Sr) | Tantalum (Ta) | Thallium (Tl) | Tin (Sn) | Titanium (Ti) | Vanadium (V) | Zinc (Zn) |
0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max |
Packing | Volume | Construction of Material |
---|---|---|
ISO Container | 12,000L | Teflon Lined sus 304 |
IBC | 1,000L | |
Drum | 200L | HDPE |
Uses |
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Cleaning and Etching for Semiconductor Manufacturing Process |